數(shù)據(jù)表格, 中國
就硅晶圓和半導體清洗工藝而言，業(yè)內(nèi)正在改用臭氧水處理方案。這種方案更環(huán)保，不涉及昂貴的廢物處理，成本比化學混合物清洗工藝更低?？上驳氖牵隊柟?W. L. Gore & Associates)提供的GORE臭氧化模組比目前市場上的溶解臭氧方案更勝一籌，提供目前市場上更潔凈、無氣泡且濃度更高的臭氧水制備方案。戈爾模組久經(jīng)驗證，是改進半導體晶圓清洗和平板顯示器制造工藝、更環(huán)保的可靠解決方案。
如需了解更多技術信息，請下載數(shù)據(jù)表或立即聯(lián)系戈爾銷售代表。
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